Photoconductive member for an electrophotographic machine and method of forming same
US7261986B2 · kind B2 · utility
0Cited by
4References
6Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 30, 2004 |
| Grant date | Aug 28, 2007 |
| Priority date | — |
| Expiry date | Nov 24, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23G1/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing a substrate for a photoconductive member includes etching the substrate with a self-limiting acid that removes the metal oxides from but does not affect the surface roughness of the substrate inner and outer surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.