Manufacturing method for donor film with improved surface roughness
US7264915B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2006 |
| Grant date | Sep 4, 2007 |
| Priority date | — |
| Expiry date | Sep 12, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/136
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A manufacturing method using an additional heat-treatment process for a donor film with improved surface roughness. The improved donor film, used in a laser induced thermal imaging method, is capable of enhancing the lifetime of products and reducing the defect rates thereof. A manufacturing method for a donor film according to the invention, includes: providing a donor film comprising a base film, a light-to-heat conversion layer and an organic film; heating the donor film to provide a heat-treated donor film; and cooling the heat-treated donor film. The surface roughness of a donor film can be improved, and the non-uniform distribution of a laser on a region subjected to the LITI process can be minimized to prevent the over- or under-transfer of an transferred organic film, etc., and the non-uniform adhesion of the transferred organic film with an acceptor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.