Patent · US Active

Method of producing polishing cloth

US7267601B2 · kind B2 · utility

2Cited by
7References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 8, 2006
Grant dateSep 11, 2007
Priority date
Expiry dateAug 8, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24314
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A polishing cloth to be produced has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length. Such a polishing cloth is produced by applying a foamable coating material such as a foamable resin over a surface of the base material, foaming the foamable coating material to form the surface layer, and forming the linear cuts through the non-foamed layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.