Multilayered structure, multilayered structure array and method of manufacturing the same
US7268017B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 7, 2005 |
| Grant date | Sep 11, 2007 |
| Priority date | — |
| Expiry date | Jan 28, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/875
Abstract
The productivity of a multilayered structure etc. is improved by easily forming insulating films for insulating internal electrode layers from side electrodes. The multilayered structure includes: a first internal electrode layer including a first conducting material extending to a first side surface of the multilayered structure and having magnetism at a predetermined temperature and a second conducting material extending to a second side surface of the multilayered structure and having no magnetism at the predetermined temperature; a dielectric layer formed on the first internal electrode layer; a second internal electrode layer including the second conducting material extending to the first side surface and the first conducting material extending to the second side surface; a first insulating film formed on the first internal electrode layer in the first side surface; and a second insulating film formed on the second internal electrode layer in the second side surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.