Automated low-volume tangential flow filtration process development device
US7270744B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2004 |
| Grant date | Sep 18, 2007 |
| Priority date | — |
| Expiry date | Mar 31, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/4077
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An automated process development device providing flexibility and accuracy for the investigative development of tangential flow filtration (tff) processes and used for evaluating the process parameters of a laboratory scale tff process with an eye towards developing a commercial scale process. The device—operable to a recirculation volume of less than 20 milliliters—includes: a reservoir having a distinct mixing zone; a tff module; conduits defining a fluid process stream through which a liquid sample is recirculated; pumps for driving and valves for regulating the flow of the liquid sample through the stream; sensors for acquiring data about the sample as it flows through the stream; and an electronic data processing network capable of receiving, transmitting, processing, and recording data associated with the operation of the pumps, valves, and sensors, the recorded data being sufficiently comprehensive to determine the conduct of the tangential flow filtration process at a substantially larger scale.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.