Multiple shadow mask structure for deposition shadow mask protection and method of making and using same
US7271094B2 · kind B2 · utility
5Cited by
7References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 23, 2004 |
| Grant date | Sep 18, 2007 |
| Priority date | — |
| Expiry date | Jul 18, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is a multi-layer shadow mask and method of use thereof. The multi-layer shadow mask includes a sacrificial mask bonded to a deposition mask. The sacrificial mask provides protection against an accumulation of evaporant on the deposition mask which would cause the deposition mask to deform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.