Shadow mask deposition of materials using reconfigurable shadow masks
US7271111B2 · kind B2 · utility
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17References
8Claims
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Key dates
| Filing date | Jun 8, 2005 |
| Grant date | Sep 18, 2007 |
| Priority date | — |
| Expiry date | Oct 21, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/944
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials from the material deposition sources are deposited on the substrate via openings in corresponding compound shadow masks, each opening being formed by the whole or partial alignment of apertures in the shadow masks forming the compound shadow mask, to form an array of electronic elements on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.