Capacitive discharge plasma ion source
US7274015B2 · kind B2 · utility
27Cited by
86References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2002 |
| Grant date | Sep 25, 2007 |
| Priority date | — |
| Expiry date | Jun 3, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/466
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a system for chemical analysis, an RF-driven plasma ionization device including a pair of spaced-apart and plasma-isolated electrodes, the electrodes are connected to a power source wherein the electrodes act as plates of a capacitor of a resonant circuit, the gas electrically discharges and creates a plasma of both positive and negative ions, and the voltage is applied as a continuous alternating waveform or as a series of pulses, such as a packet waveform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.