Pulsed plasma element
US7274333B1 · kind B1 · utility
8Cited by
9References
17Claims
0Family size
Inventor
Key dates
| Filing date | Dec 3, 2004 |
| Grant date | Sep 25, 2007 |
| Priority date | — |
| Expiry date | Jan 26, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of operating a plasma antenna, reflector, director, and barrier, where the plasma antenna is pulsed at a pulse power for a pulse duration and a pulse frequency to energize a plasma within the plasma antenna for an afterglow duration, where the pulse duration is shorter than the afterglow duration. In this manner, the power required to operate the plasma antenna is dramatically reduced, while the power at which the antenna operates can be dramatically increased. In addition, the antenna operates primarily in the low noise afterglow phase. Thus, several problems in regard to the prior art are overcome.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.