Method for automatically providing data for the focus monitoring of a lithographic process
US7277160B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 11, 2005 |
| Grant date | Oct 2, 2007 |
| Priority date | — |
| Expiry date | Jun 7, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for automatically providing data for the focus monitoring of a lithographic exposure process is disclosed. Firstly, the file for a wafer is generated, which holds at least the information of the size of the wafer, the position of a plurality of measurement pattern, the order in which the measurement patterns are captured and registered, and the alignment of the measurement pattern. Secondly, this information is stored in a master grid. Thirdly, images are acquired of the pattern of each position stored in the master grid of the generated file, wherein the image acquisition is carried out according to the order as stored. Finally, names are assigned to the acquired images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.