Ink jettable overprint compositions
US7279506B2 · kind B2 · utility
23Cited by
25References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 5, 2004 |
| Grant date | Oct 9, 2007 |
| Priority date | — |
| Expiry date | May 13, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D11/54
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Ink jettable, radiation curable overprint compositions containing at least one radiation curable oligomer/monomer, at least one photoinitiator, and at least one surfactant are disclosed. The overprint compositions are particularly well-suited for protecting ink-based and toner-based images on substrates subjected to abrasives, heat, and/or sunlight since the compositions protect such images from smearing, cracking, and fading.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.