Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film
US7281491B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 5, 2003 |
| Grant date | Oct 16, 2007 |
| Priority date | — |
| Expiry date | Jul 5, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/914
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A dielectric-coated electrode having a conductive base material coated with a dielectric on a surface thereof, the dielectric including a first metal atom and a second metal atom. As for an ionic strength of the first metal atom and an ionic strength of the second metal atom according to a dynamic SIMS measurement, the ionic strength of the second metal atom is larger than the ionic strength of the first metal atom from the most surface of the dielectric toward a predetermined depth of the dielectric, and the ionic strength of the first metal atom is larger than the ionic strength of the second metal atom from the predetermined depth toward the surface of the conductive base material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.