Method of forming an integrated optical circuit
US7282311B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2004 |
| Grant date | Oct 16, 2007 |
| Priority date | — |
| Expiry date | May 3, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/13
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is disclosed for forming an optical circuit on a substrate. The method includes the deployment of a plurality of mask images to define an optical circuit image in photoresist. Each of the mask images define parts of the optical circuit and the totality of all mask images substantially define an optical circuit. A photolithography system globally aligns and exposes the mask images in photoresist. The resultant composite image is substantially indistinguishable from a single image of the entire optical circuit. Different images for each of the mask image parts can be substituted with other images or image parts and thereby exponentially increasing the number of circuit permutations from a predetermined number of available mask images. The method is also applicable to generating a unique optical circuit from a pre-existing library of reticle images. The images are printed in predetermined locations on a substrate to define the desired optical circuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.