Micro electrical mechanical system (MEMS) tuning using focused ion beams
US7282834B2 · kind B2 · utility
4Cited by
34References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2005 |
| Grant date | Oct 16, 2007 |
| Priority date | — |
| Expiry date | Nov 19, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H3/0077
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
A method for tuning an electro-mechanical device such as a MEMS device is disclosed. The method comprises operating a MEMS device in a depressurized system and using FIB micromachining to remove a portion of the MEMS device. Additionally, a method for tuning a plurality of MEMS devices by depositing an active layer and then removing a portion of the active layer using FIB micromachining. Also, a method for tuning a MEMS device and vacuum packaging the MEMS device in situ are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.