Patent · US Expired

Solid state image pickup device, method for producing the same, and image pickup system comprising the solid state image pickup device

US7283305B2 · kind B2 · utility

48Cited by
8References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 19, 2004
Grant dateOct 16, 2007
Priority date
Expiry dateFeb 4, 2026

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F77/413

Abstract

The present invention inhibits variations in sensitivity of an image pickup element formed in a jointed area in the image pickup element produced using exposure in a joined fashion.The image pickup element 11 has a light receiving area 102 formed on a substrate 101, an insulation layer 104 deposited on a light receiving area 102, and a microlens 106 formed on the insulation layer 104 and collecting incident light onto the light receiving area 102. A pattern 103L and a pattern 103R with an optical axis of the microlens 106 as a divisional line by exposure in a joined fashion in different exposure steps are arranged with an optical path for incident light collected by the microlens 106 held therebetween, and are provided so that a clearance from the optical path equals a distance L. The distance L is set to be larger than the alignment accuracy of an exposure device exposing the patterns 103L and 103R.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.