Lapping monitor device, system and method
US7287316B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2002 |
| Grant date | Oct 30, 2007 |
| Priority date | — |
| Expiry date | Nov 22, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53165
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A lapping monitor element that is juxtaposed with a magnetic transducer element having a magnetoresistance effect film to determine the lapping position upon lapping the element height of the magnetic transducer element to a predetermined dimension. The lapping monitor element includes a resistance film to be resistance measured. The resistance film is a metal film of nonmagnetic transition metal or of alloy composed mainly of nonmagnetic transition metal, or a multilayered film where two or more such metal films are laid one upon another. The lapping monitor makes it possible to extremely stabilize the ELG sensor resistance measured values upon lapping as well as to provide a high accuracy MR height control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.