Selective deposition of materials on countoured surfaces
US7288394B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 23, 2003 |
| Grant date | Oct 30, 2007 |
| Priority date | — |
| Expiry date | Jul 24, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S530/815
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of patterning materials, such as proteins, on a contoured surface by depositing them onto protrusions on a surface, and a cell containment device that may be constructed by this method, are provided. The method may involve selectively depositing a material on a substrate including a contoured surface including protrusions and recesses. By applying a first fluid to the contoured surface and allowing the first fluid to distribute across only a portion of the contoured surface, a material may be deposited on the protrusions and not the recesses, or on the recesses and not the protrusions. Such a method may be used to selectively pattern cells or other materials on substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.