System and method for calculating a shift value between pattern instances
US7289868B2 · kind B2 · utility
4Cited by
13References
30Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 22, 2005 |
| Grant date | Oct 30, 2007 |
| Priority date | — |
| Expiry date | Dec 30, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/975
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method comprising adjusting a first relative position between a substrate and a fabrication unit by a first shift value, forming a first pattern relative to a first pattern instance on the substrate subsequent to adjusting the first relative position by the first shift value, and calculating a second shift value using a first displacement between the first pattern and the first pattern instance and a second displacement between a second relative position of the first pattern instance with respect to a second pattern instance is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.