Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same
US7291439B2 · kind B2 · utility
6Cited by
8References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2006 |
| Grant date | Nov 6, 2007 |
| Priority date | — |
| Expiry date | Jul 7, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing a uniform photoresist in a channel region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.