Measuring rotational misalignment using spatial interference patterns
US7292050B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2006 |
| Grant date | Nov 6, 2007 |
| Priority date | — |
| Expiry date | Aug 23, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/30107
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for determining misalignment between two semiconductor dies is described in which signals are transmitted through a first subset of an array of proximity connectors that are proximate to a surface of one of the semiconductor dies and received through a second subset of an array of proximity connectors that are proximate to a surface of the other semiconductor die. A spatial beat frequency is determined from the received signals. This spatial beat frequency corresponds to misalignment-induced aliasing of spatial frequencies associated with the first subset of the array of proximity connectors and the second subset of the array of proximity connectors. The misalignment is then determined using the spatial beat frequency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.