Method and apparatus for detecting faults in transparent material
US7292332B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 29, 2004 |
| Grant date | Nov 6, 2007 |
| Priority date | — |
| Expiry date | Dec 27, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8962
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The method for detecting faults in transparent material includes irradiating a definite partial volume in the material with a first radiation source and coupling light into the material from a second source so that its optical path in the partial volume extends in the interior of the material. A fault in the partial volume is detected by light scattering, bright field absorption, and/or deflection of light of the first radiation source by the fault. The apparatus for detecting faults includes a first radiation source for illuminating a definite partial volume of the material, a detector for detecting light from this partial volume, and a second radiation source. The second radiation source is arranged in relation to the material so that the associated optical path in the partial volume passes exclusively in the interior of the material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.