Fluorinated sulfonamide surfactants for aqueous cleaning solutions
US7294610B2 · kind B2 · utility
4Cited by
9References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2004 |
| Grant date | Nov 13, 2007 |
| Priority date | — |
| Expiry date | Mar 15, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.