Scanning electron microscope
US7294834B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 16, 2005 |
| Grant date | Nov 13, 2007 |
| Priority date | — |
| Expiry date | Dec 30, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24485
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a scanning electron microscope, an emitted primary electron beam is diverted by an angle of at least about 45 degrees prior to incidence with a specimen. The beam may be bent by a magnetic separator. The separator may also serve to deflect secondary electron and back scattered electrons. As the angle of emissions and reflections from the specimen is close to the angle of incidence, bending the primary electron beam prior to incidence, allows the electron source to be located so as not to obstruct the travel of emissions and reflections to suitable detectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.