Methods and systems for measuring an aberated wave front
US7295292B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2005 |
| Grant date | Nov 13, 2007 |
| Priority date | — |
| Expiry date | Jan 24, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems are described for a system for measuring aberrations in a wave front. In the improved system multiple closely-spaced, small-aperture laser beams traverse an aberrating flow that introduces deflections of small-aperture laser beams from which aberrated wavefronts can be constructed. These beams may then be focused on position sensing devices using focusing lenses. The position sensing devices may then detect the positions of these beams and a difference between the detected position and the unaberrated position of the beams detected. This information may then be used to determine information regarding the optical aberrations introduced by the flow that may be used, for example, in improving communications systems and/or laser weapon systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.