Patent · US Active

Impact-resistant shutter assembly

US7296384B2 · kind B2 · utility

6Cited by
22References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 29, 2006
Grant dateNov 20, 2007
Priority date
Expiry dateNov 29, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/3192
  • WIPO fieldCivil engineering
  • WIPO sectorOther fields

Abstract

An impact-resistant shutter does not fracture upon impact from debris. The shutter includes a decorative panel and a support panel. The decorative panel has an outer surface and an inner surface and includes a first chemical composition. The support panel has a first surface and a second surface and includes a fiber composition. The fiber composition is incompatible with the first chemical composition. A second chemical composition is integrated into the support panel at the first surface. The second chemical composition is compatible with the first chemical composition. Due to this second chemical composition present at the first surface, the fiber composition in the support panel can be bonded to the inner surface of the decorative panel. The fiber composition provides impact resistance to the decorative panel to prevent fracturing of the decorative panel upon impact from debris.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.