Patent · US Expired

Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition

US7297895B2 · kind B2 · utility

5Cited by
21References
5Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 18, 2004
Grant dateNov 20, 2007
Priority date
Expiry dateOct 18, 2024

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB08B7/0042
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute particles (for example, micrometer and nanometer sizes) and assure that they will not redeposit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.