Method of manufacturing liquid discharge head
US7300596B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2006 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Jul 7, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/1645
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The method of manufacturing a recording head has a flow path wall forming step of forming flow path walls on a substrate having energy generating elements formed thereon, an imbedded material depositing step of depositing an imbedded material between the flow path walls and on a top of each flow path wall, a flattening step of polishing a top of the deposited imbedded material, until the top of the flow path wall is exposed, and a step of forming an orifice plate on the tops of the polished imbedded material and the exposed flow path wall. In the step of forming the flow path walls, patterning of a close contact property improvement layer is simultaneously performed to improve a close contact property between the flow path wall and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.