Photobase generator and curable composition
US7300747B2 · kind B2 · utility
20Cited by
2References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2005 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Jul 10, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/124
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The photobase generator of the invention is represented by the following formula 1:wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.