Method of manufacturing a liquid crystal display device
US7300828B2 · kind B2 · utility
0Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2006 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Apr 26, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/441
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a photoresist film which is formed in a manner of covering at least a source electrode, a source line, a pixel electrode, a drain electrode, a drain line, a semiconductor film and a protective film, and further covering a gate insulting film in their vicinities. Moreover, wet and dry etchings are sequentially performed by using the photoresist film as a mask. Due to this etching, a residual pattern existing on the gate insulating film is etched.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.