Patent · US Expired

Device for analysing a wavefront with enhanced resolution

US7301613B2 · kind B2 · utility

2Cited by
5References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 12, 2002
Grant dateNov 27, 2007
Priority date
Expiry dateJul 25, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01J9/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A wavefront analysing device, of the Hartmann or Shack-Hartmann type, comprises in particular a set of sampling elements arranged in an analysis plane, and forming as many micro-lenses for sampling the incident wavefront, and a diffraction plane wherein are analysed the Airy discs of the different micro-lenses illuminated by the incident wavefront. The shape of each micro-lens is such that the associated diffraction figure has in the diffraction plane one or several preferential axe(s), and the microlenses are oriented in the analysis plane such that the preferential axe(s) of the diffraction figure of a micro-lens are offset relative to the preferential axes of the diffraction figures of neighbouring micro-lenses, thereby enabling to limit the overlapping of the diffraction figures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.