Method for manufacturing photoresist having nanoparticles
US7306899B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 24, 2006 |
| Grant date | Dec 11, 2007 |
| Priority date | — |
| Expiry date | Jul 24, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0047
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions (211); adding a sulfide containing sulfur ions (231) into the aqueous solution; adding a polymerizable surfactant (220) into the aqueous solution thereby forming metallic ion reverse micelles (210) and sulfur ion reverse micelles (230); reacting the metallic ion reverse micelles and the sulfur ion reverse micelles to create monomeric sulfureted metal nanoparticle reverse micelles (240); aggregating the monomeric sulfureted metal nanoparticle reverse micelles to polymeric macromolecular nanoparticles; and doping the polymeric macromolecules nanoparticles into a base material in order to obtain the photoresist having sulfureted metal nanoparticles. A diameter of the nanoparticles is in the range from 1×10−9 meters to 1×10−7 meters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.