System and method for controlling composition for lithography process in real time using near infrared spectrometer
US7307259B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2005 |
| Grant date | Dec 11, 2007 |
| Priority date | — |
| Expiry date | Feb 1, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.