Patent · US Expired

Method for determining and evaluating defects in a sample surface

US7308127B2 · kind B2 · utility

0Cited by

17References

9Claims

0Family size

Assignee

ATLAS Material Testing Technology GmbH · US

Inventors

Christian Bernatek · Rodgau, DE
Frank Kellner · Bad Hersfeld, DE
Peter March · Austin, US

Key dates

Filing date	Dec 12, 2001
Grant date	Dec 11, 2007
Priority date	—
Expiry date	May 5, 2024

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30156
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

In this method, the surface to be investigated is first of all exposed to collimated light and the radiation rejected therefrom supplied to a position-resolving image processing means. Then, a mask is generated on the basis of the image supplied by the image processing means, said mask having masked regions being defined by relatively bright areas of said image and unmasked regions being defined by relatively dark areas of said image. Now, the surface to be investigated is exposed to diffuse light and the radiation rejected therefrom supplied to the image processing means, with only the radiation from the unmasked regions being taken into consideration for analyzing purposes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.