Method for fabricating an imprint mold structure
US7309515B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 4, 2004 |
| Grant date | Dec 18, 2007 |
| Priority date | — |
| Expiry date | Feb 7, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention is related to a method for fabricating an imprint mold which can be used in the field of nano-imprint lithography. Firstly, a diamond film and a photoresist film are successively formed onto a substrate; wherein the photoresist film is more capable of anticorrosion than the diamond film. Then an energy beam lithography system is provided to make the photoresist film form a photoresist mask with particularly arranged patterns. Because of the etching selectivity between the diamond film and the photoresist film, on the surface of the diamond film a pattern can be easily formed with recessions and protrusions according to the photoresist mask by dry etching method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.