Ultra low residual reflection, low stress lens coating
US7311938B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 19, 2005 |
| Grant date | Dec 25, 2007 |
| Priority date | — |
| Expiry date | Jan 21, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K3/36
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses made using a molding procedure which provides a low stress lens substrate. In one aspect the method uses special coating compositions with one being a high index of refraction composition and the other being a low index of refraction composition. In another aspect a method is also disclosed using an optical monitor in conjunction with a conventional vapor deposition apparatus whereby an optical reference lens is used and a particular light frequency of reflected light is measured and this measurement is then used to determine when the desired optical coating is achieved. In a still further aspect the method also preferably calculates the optical thickness of each layer using a specific ratio of blue to green to red colors in the reflected light. The stress of the AR coating is also controlled by adjusting the optical thickness for each layer, if necessary, to minimize the difference in the tensile stresses and compressi…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.