Templated monolayer polymerization and replication
US7311943B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 17, 2003 |
| Grant date | Dec 25, 2007 |
| Priority date | — |
| Expiry date | Sep 9, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/883
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A self-replicating monolayer system employing polymerization of monomers or nanoparticle ensembles on a defined template provides a method for synthesis of two-dimensional single molecule polymers. Systems of self-replicating monolayers may be used as templates for the growth of inorganic colloids. A preferred embodiment is a SAM-based replication, wherein an initial monolayer is patterned and used as a template for self-assembly of a second monolayer by molecular recognition. Once the second monolayer has formed, it is polymerized in place and the two monolayers are separated to form a replicate. Both monolayers may then function as templates for monolayer assemblies. A generic self-replicating monomer unit suitable for use in one embodiment comprises a polymerizable moiety attached by methylene repeats to a recognition element and an ending unit that will not interfere with the chosen recognition chemistry. The recognition element is self-complementary, unless a set of two replicating monomers with compatible cross-linking chemistry is employed. In a two-component replication system utilizing two different kinds of recognition chemistries, the initial template undergoes replicati…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.