Electron beam depicting method, mother die manufacturing method, mother die, metallic mold manufacturing method, metallic mold and optical element
US7312447B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2004 |
| Grant date | Dec 25, 2007 |
| Priority date | — |
| Expiry date | Apr 25, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0005
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
There is described a method for depicting a predetermined pattern, such as a diffraction pattern employed in an optical element, on a substrate. The method includes the steps of: acquiring shape data of the predetermined pattern; generating a first input signal for deflecting an electron beam emitted from an electron gun in a main-scanning direction, and a second input signal for deflecting the electron beam in a sub-scanning direction, based on the shape data of the predetermined pattern; adjusting an alternating bias signal, having a specific frequency, according to the shape data of the predetermined pattern; superposing the alternating bias signal on the second input signal; and deflecting the electron beam emitted from the electron gun in the sub-scanning direction according to the second input signal on which the alternating bias signal is superposed, while scanning the electron beam by deflecting it in a main-scanning direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.