System and method for processing masks with oblique features
US7314689B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2004 |
| Grant date | Jan 1, 2008 |
| Priority date | — |
| Expiry date | Jun 11, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7049
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system is disclosed for processing one or more oblique features on a mask or reticle substrate. After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed on the mask or reticle substrate with regard to either the horizontal or vertical reference direction of the predetermined reference system is determined. The mask or reticle substrate is rotated in a predetermined direction by the offset angle; and the feature on the mask or reticle substrate is processed using the predetermined reference system wherein the feature is processed in either the horizontal or vertical reference direction thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.