Surface plasmon enhanced illumination system
US7318907B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2002 |
| Grant date | Jan 15, 2008 |
| Priority date | — |
| Expiry date | Mar 17, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/11
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for producing small, bright nanometric light sources from apertures that are smaller than the wavelength of the emitted light. Light is directed at a surface layer of metal onto a light barrier structure that includes one or more apertures each of which directs a small spot of light onto a target. The incident light excites surface plasmons (electron density fluctuations) in the top metal surface layer and this energy couples through the apertures to the opposing surface where it is emitted as light from the apertures or from the rims of the apertures. Means are employed to prevent or severely limit the extent to which surface plasmons are induced on the surface at the aperture exit, thereby constraining the resulting emissions to small target areas. The resulting small spot illumination may be used to increase the resolution of microscopes and photolithographic processes, increase the storage capacity and performance of optical data storage systems, and analyze the properties of small objects such as protein and nucleic acid molecules and single cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.