Refrigerant for low temperature applications
US7320763B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2005 |
| Grant date | Jan 22, 2008 |
| Priority date | — |
| Expiry date | Dec 28, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC10N2020/101
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An apparatus and method wherein potential ozone layer-damaging chlorodifluoromethane (Refrigerant R-22) is substituted with a mix of less environmentally damaging refrigerants pentafluoroethane and tetrafluoroethane in chlorodifluoromethane-based air-cooling systems for low temperature applications. While less environmentally damaging than chlorodifluoromethane, the substitute refrigerant has a temperature-pressure relationship similar to that of chlorodifluoromethane, making the substitute refrigerant suitable for use with chlorodifluoromethane-based low temperature systems. In this event, it is mixed with a relatively small percentage of a lubricating oil which is compatible with both the unit refrigerant and typical R-22 system design.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.