Device and method for laser marking
US7321377B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2004 |
| Grant date | Jan 22, 2008 |
| Priority date | — |
| Expiry date | May 5, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C2200/39
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
When laser beams with a wavelength of 9.3 μm or 9.6 μm are used, a pulse width t (μsec) which is a radiation time of the laser beam and an energy density E (kw/cm2) of the laser beam on an X-ray film are set such that they meet requirements based on an area A between line segments A1 and A2. Moreover, when laser beams with a wavelength of a 10-micrometer band, such as 10.6 μm, is used, the pulse width and the energy density are set such that they meet requirements based on an area B between line segments B1 and B2. As a result, since the pulse width t is within a range of equal to or larger than 3 μsec and smaller than 30 μsec, a high-quality marking pattern with excellent visibility can be formed while improving the productivity of the X-ray film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.