Ultra-short wavelength x-ray system
US7321604B2 · kind B2 · utility
10Cited by
12References
29Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 7, 2004 |
| Grant date | Jan 22, 2008 |
| Priority date | — |
| Expiry date | Apr 6, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0959
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus to generate a beam of coherent light including x-rays or XUV by colliding a high-intensity laser pulse with an electron beam that is accelerated by a synchronized laser pulse. Applications include x-ray and EUV lithography, protein structural analysis, plasma diagnostics, x-ray diffraction, crack analysis, non-destructive testing, surface science and ultrafast science.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.