Coating apparatus and method using the same
US7326300B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2005 |
| Grant date | Feb 5, 2008 |
| Priority date | — |
| Expiry date | Aug 4, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (224) for photoresist material. The photoresist coating nozzle is disposed above the work table, and the supplying device connects to the coating nozzle for supplying photoresist thereto. In operation, the substrate to be coated is continuously suspended in the gas just above but not in contact with the work table. Therefore, accumulation of static electricity and/or foreign particles on the substrate can be avoided. Gas emitting from the blowing holes can remove foreign particles from the surface of the work table and the backside of the work table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.