Method of observing monolayer ultraviolet decomposition process, method of controlling degree of surface decomposition, and patterning method
US7326580B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 9, 2004 |
| Grant date | Feb 5, 2008 |
| Priority date | — |
| Expiry date | Nov 24, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Aspects of the invention can provide a method of effectively observing the photodecomposition process of a monolayer in real time. The invention can provide a method of observing the decomposition process of a monolayer when the monolayer is irradiated with UV rays, where the structure of the constituent molecule of the monolayer in an ultrahigh vacuum atmosphere and an oxygen-containing atmosphere respectively can be measured by a molecular structure measuring device during the UV irradiation. The invention can also provide a method of controlling the degree of surface decomposition of the monolayer that controls the ozone concentration accompanying the UV irradiation based on observation results obtained by using the observation method. The invention can further provide a method of patterning the monolayer that employs the control method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.