Transparent conductive film and its manufacturing method, and photoelectric conversion device comprising it
US7332226B2 · kind B2 · utility
9Cited by
5References
12Claims
0Family size
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Key dates
| Filing date | Nov 20, 2001 |
| Grant date | Feb 19, 2008 |
| Priority date | — |
| Expiry date | Sep 11, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24364
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of χ2 type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of χ2 type having a degree of freedom of 10-35χ2, the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.