Patent · US Expired

Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays

US7332273B2 · kind B2 · utility

6Cited by
12References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 20, 2002
Grant dateFeb 19, 2008
Priority date
Expiry dateJun 20, 2022

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC40B40/06
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.