Device and method for imaging a multiple particle beam on a substrate

US7332730B2 · kind B2 · utility

Assignee

• Leica Microsystems Lithography · DE

Inventors

• Joachim Heinitz · Jena, DE
• Andreas Schubert

Key dates

• Filing date: Nov 9, 2005
• Grant date: Feb 19, 2008
• Expiry date: Aug 4, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N23/04
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system. The laser path measurement system relays positional data with a fixed clock rate to a synchronization and control device 50 that positions the beam base point along the x-coordinate and the y-coordinate via a beam tracking system, taking into account the corrective data and pixel phase, whereby precise staircase beam-to-table positioning is achieved across the entire substrate in spite of faulty table movement.