Lithography apparatus and pattern forming method using the same having an liquid crystal panel for a photo mask function
US7332734B2 · kind B2 · utility
0Cited by
3References
30Claims
0Family size
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Key dates
| Filing date | May 31, 2005 |
| Grant date | Feb 19, 2008 |
| Priority date | — |
| Expiry date | Jul 21, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography apparatus is provided. The apparatus includes: a stage, a first light source unit, an optical system, an image obtaining means, an image edit means, an LC panel, and a second light source unit. The LC panel is coupled with the optical system and receives a signal of the image edited by the image edit means and displays the received image to perform a photo mask function. The second light source unit provides light used in performing an exposure on the test material using the imaged displayed on the LC panel for a photo mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.