High strength vacuum deposited nitinol alloy films and method of making same
US7335426B2 · kind B2 · utility
30Cited by
21References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2002 |
| Grant date | Feb 26, 2008 |
| Priority date | — |
| Expiry date | Jul 13, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/125
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process parameters in order to create high-strength nitinol films that exhibit shape memory and/or superelastic properties without the need for precipitation annealing to attenuate the transition conditions of the deposited material. A vacuum deposited nitinol film having high-strength properties equal to or better than wrought nitinol films and which are characterized by having non-columnar crystal grain structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.