Method and device for the subjective determination of aberrations of higher order
US7338173B2 · kind B2 · utility
20Cited by
5References
4Claims
0Family size
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Key dates
| Filing date | Jan 28, 2002 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | Nov 23, 2023 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/028
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A device for the subjective determination of aberrations of higher orders Xi in an optical system, in particular in an eye includes at least one observation channel into which defined plates can be introduced, the individual plates having optically active structures which correspond to a defined Zernike polynomial and to a defined amplitude, at least one order Xi of the Zemike polynomial being greater than two.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.