Patent · US Expired

Method and device for the subjective determination of aberrations of higher order

US7338173B2 · kind B2 · utility

20Cited by
5References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 28, 2002
Grant dateMar 4, 2008
Priority date
Expiry dateNov 23, 2023

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61B3/028
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

A device for the subjective determination of aberrations of higher orders Xi in an optical system, in particular in an eye includes at least one observation channel into which defined plates can be introduced, the individual plates having optically active structures which correspond to a defined Zernike polynomial and to a defined amplitude, at least one order Xi of the Zemike polynomial being greater than two.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.